EQP – Mass and Energy Analyzer for Plasma Diagnostics and Langmuir probeHiden Analytical, Great Britain | ![]() |
GEC plasma reactorHuntington, USAReactor for plasma etching and rf plasma optimisation. The reactor is standardized GEC cell vacuum chamber with ICP and movable CCP electrodes. | ![]() |
Barthel RFA0.1/50-100 (version B00) pulse power amplifierBarthel HF Technik, Germany– Frequency range 0.1-50 MHz – Power > 100W (CW) – Amplification 50-56 dB |
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TSU 521/Duo 10M Turbo CubePfeiffer Vacuum, Germany (SCAN, Slovenia)– Pumping speed for N2 500 l/s – Pumping speed of mechanical pump: 3.3 m3/h – Minimum pressure: 1×10-8 mbar |
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ATP 400C Turbomolecular Pumping SystemAdixen, Alcatel Vacuum Technology2 stages, nominal flow rate 15 m3/h, ultimate pressure 3×10-1 Pa |
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Swarm experimentselfmadeSwarm experiment for measurement of excitation coefficients in various gases | ![]() |
Breakdown/Pulsed glow discharge experimentselfmadeExperiment for determination of electrical and optical characteristic of low-pressure dc discharges | ![]() |
ALCATEL 120 Turbomolecular Pumping SystemAdixen, Alcatel Vacuum Technology2 stages, nominal flow rate 15 m3/h, ultimate pressure 3×10-1 Pa | ![]() |
Signal generatorAgilent N9310AAccurate CW, analog modulated (AM, FM, ΦM) and pulse modulated signals, 9 kHz to 3 GHz with 0.1 Hz resolution, SSB <-95 dBc/Hz | ![]() |
OscilloscopeAgilent Oscilloscope DSO6052A500 MHz Bandwidth, 2 analog channels, 4 GSa/s sample rate | ![]() |
Pulse/Delay GeneratorBNC Model 555 Pulse/Delay GeneratorDelay: 0 to 99.999999999 Pulse Width: 10 ns to 99.999999999 Delay Resolution: 1 ns |
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Power Generator + match boxDressler Cesar RF Power Generator 1310Frequency:13.560 MHz RF power:0 – 1000 W Reflected power max: 40% of Pmax. Impedance:50 Ohms |
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Function GeneratorPeakTech DDS Function Generator 4025high frequency accuracy: up to 10-5 high frequency resolution: 20 mHz high waveform accuracy: 16 types of waveforms |
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Big plasma chamber13.56 MHz capacitively coupled low pressure large scale glow discharge chamber | ![]() |
Small plasma chamber13.56 MHz capacitively coupled low pressure glow discharge chamber suitable for treatment of seeds and textile | ![]() |
System for plasma jetFrequency 25-125 kHz Voltage up to 12 KV p-p Flow of helium up to 7 slm |
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System for plasma needleFrequency 13.56 MHz Flow of helium up to 7 slm |
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HI CUBE Classic pumping stationScanPumping speed: 685 1/s Ultimate pressure < 5×10-10 mbar |
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Oscilloscope DSO6104AAgilent1 GHz Bandwidth 4 analog channels 4 GSa/s sample rate |
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Oscilloscope DSO6054AAgilent500 MHz Bandwidth 4 analog channels 4 GSa/s sample rate |
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Oscilloscope TDS5104BTektronix4 independent 1 GHz Channels 5 GS/s Maximum Real-time Sample Rate 100,000 wfms/s Maximum Waveform Capture Rate |
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Probe Dependent TCP312TektronixAC/DC Measurement Capabilities DC – 100 MHz, Current Probe Amplifier DC – 100 MHz, 30 A DC |
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Current Probe TCP0030TektronixDC to >120 MHz Bandwidth 30 A RMS Maximum Current Capability 50 A Peak Pulse Current Capability |
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High-voltage Differential Probes P5210TektronixBandwidths up to 100 MHz Up to 5,600 V Differential (DC + pk AC) Up to 2,200 V Common (RMS) |
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